AR226-2649 39 AR226-2649 ISC Modeling Methodology and Results Emission Source Information The ISC3 model was used to calculate ambient ground-level air concentrations and deposition rates for year 2000 actual C8 emissions from the Washington Works site.

AR226-2669 '1 01 \ CD AR226-2669 September 2002 Through August 2003 Air Dispersion Modeling Analysis of APFO Emissions (Revised) May 24,2004 Page 1 of 9 SEPTEMBER 2002 THROUGH AUGUST 2003 AIR DISPERSION MODELING ANALYSIS OF APFO EMISSIONS (Revised) DuPont Washington Works Facility Parkersburg, West Virginia Prepared for: West Virginia Department of Environmental Protection Division of Air Quality 7012 MacCorkle Ave, SE Charleston, WV 25304-2943 Prepared by: DuPont Engineering Technology (DuET) Environmental Section Wilmington, DE 19898 C:\c8\c8_0803_report_revised May 24,2004 ] a September 2002 Through August 2003 Air Dispersion Modeling Analysis ofAPFO Emissions (Revised) May 24,2004 Page 2 of 9 1.

AR226-2687 9 AR226-2687 DuPont EMSE Report No. 18-02 FINAL REPORT Study Title ACTIVATED SLUDGE RESPIRATION INHIBITION TEST OF TELOMER B 8-2 ALCOHOL|QECD 209) ;'., ./'...; Test Guideline OECD (1984) Guideline for Testing of Chemicals, Section 2, No. 209: "Activated Sludge, Respiration Inhibition Test", adopted April 4,1984 Author William R.

PFAS Content: Request for exemption Org. name: Zhejiang Juhua Hanzheng New Materials Co., Ltd.

AR226-2834 Material Tested: Copies to: E, I, du Font de Nemours and Company Haskell Laboratory for Toxicology and Industrial!

Guidance Document - AGC Chemicals Europe Ltd 1.

Updated since the Call for Evidence/Royal Haskoning studies Semiconductor Man Use Category Photolithography Photolithography Photolithography Photolithography Photolithography Photolithography Nanoimprint Lithography Photoresist Color Filter photoresist for imaging semiconductor components "photopatterning" Plasma [Dry] Etch and Wafer Cleaning Vapour deposition chamber Wet surface modification chemistries (eg.

AkaG- M i l l Centre Analytical Laboratories.

#R246 - 3320 52 H24768:OneGeneration Reproduction Study in Rats ARA4G - 3320 DuPont 13784 --~ : TRADE SECRET : Study Title F-24768: One-Generation Reproduction Study in Rats Volume 10f2 Laboratory Project ID: DuPont-13784 -- . | Auras: Eve Mylchreest, Ph.D.

AR226-3395 Repeated Dose Oral Toxicity of 8-2 Telomer B Alcohol Range-Finding Study in Rats G.L.

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Design DESIGN AND STRUCTURE OF MULTI-CITY STUDY submittedto 3M EnvironmentalLaboratory 935 Bush Avenue St.Paul,MN 55144 submitted by Marcia Nishioka,MS and Warren StrviussM,S Atmospheric Sciencesand Applied Technology Department Statisticasnd Data AnalysisDepartment BATTELLE MEMORIAL INSTITUTE 505 King Avenue Columbus, OH 43201 May 1,2000 Purpose The Multi-Cisttyudywasdesignetdoobtaipnreliminadraytaaboutdispersioofn fluorochemicalcompounds intheenvironment,uptakeintofoods and presencein drinkingwater,and tounderstandthepotentiaslourcesofhuman exposuresthatmight resultfrom thisqW of dispersion.