THE USE OF PFAS IN CHEMICAL PLANT EQUIPMENT AN INVENTORY STUDY Final Report September 2023 Table of Contents 0011 ExEexceuctuivtieve susmummmarayry 02 Background, scope and methodology 03 PFAS: what it is and where it is used 04 PFAS alternatives & challenges 05 PFAS management 06 PFAS ban impact 07 Appendix Executive Summary (1/4) Background and methodology In May 2023, Cefic contracted Accenture to conduct a thorough mapping of uses of PFAS in chemical industry manufacturing equipment and to investigate the use and the availability of potential alternatives, as well as waste management practices To obtain a quantitative inventory, a detailed list of equipment types used in chemicals plants was compiled.

Pathology Associates International A Company of ScienceApplicationIsnternationaClorporation An&WbYe&Owmd Canvany Sponsor: 3M St.Paul,Minnesota PROTOCOL Study Title: CellProliferatiSotnudywithN-EthylPerfluorooctanesulfonamiEdtohanol(N-EtFOSE; 3M T-6316.11), PerfluorooctanSeulfonicAcid PotassiumSalt(PFOS; 3M T-6295.16),and N-EthylPerfluoroctanesulfonamide (PFOSA 3M T-7091.1)inRats Date: January 12,1999 Performing Laboratory R.O.W.

* * pneurop ** * * * FRANKFURT, 07.09.2023 PNEUROP C 18 "Process Gas Compressors" Draft PN18 technical position paper Table of content 1 Executive Summary 1 1.1 Pneurop Committee 18 (PN18, Process Gas Compressors) 2 2 The Value of Process Gas Compressors for Energy Transition and Economy 2 3 PFAS Application within Process Gas Compressors 4 3.1 Sealing applications 4 3.1.1 Centrifugal Compressors 4 3.1.2 Reciprocating Compressors 5 3.1.3 Specific Examples for Sealing Applications 6 3.1.4 Safety Aspect of Proper Sealing Method and Compounds 6 3.1.5 Valves and Dynamic Sealing 7 3.1.6 Sealing against Fugitive Emissions 7 3.2 Minimizing erosion damage by coatings 7 3.3 High temperature motor cabling 8 3.4 Coatings for bolts in Oil and Gas environments 8 3.5 Corrosion protection for process instrumentation 8 4 Conclusion 8 5 Annex: Examples for a circular approach of PFAS for process gas compressors 9 6 Additional References: 10 1 Executive Summary Pneurop is the European association of manufacturers of compressors, vacuum pumps, pneumatic tools and related equipment.

MICROBICS MICROTOXC TOXICITY TEST TEST SUBSTANCE Identity:Perfluorooctanesulfonylamido(ethyl)acetmaatye;also be referredto as PFOSAA, FC-128 or as the major component of FC-1 27, FC-1 29, FC-1 09,FC-1 09-X or Rl 904.

BALAZSTM nanoanalysis Air Liquide Electronics U.S.

ACUTE TOXICITY TO FISH (FATHEAD MINNOW) TEST SUBSTANCE Identity:Mixturecontainingperfluorooctanesulfonawtheich may also be referredtoas PFOS, FC-95, or as a component ofFC-201 F.

BIODEGRADATION (BOD/COD) TEST SUBSTANCE Identity:A mixturecontainingperfluorooctanesulfonatweh,ich may alsobe referredto as PFOS, FC-95, or as a component ofFC-203CE. (1Octanesulfonicacid)(CAS # 2795-39-3).

VDMA Valves Statement on the regulation of PFAS under the REACH Regulation Consultation process from 22.03. - 25.09.2023 The Mechanical Engineering Industry Association (VDMA) represents around 3,600 member companies in the medium-sized mechanical and plant engineering sector in Germany and Europe.

MICROBICS MICROTOXO TEST SUBSTANCE.

ACTIVATED SLUDGE TEST SU RESPIRATION INHIBITION TEST Identity:Mixturecontainingperfluorooctanesulfonawtheich may alsobe referredtoas PFOS, FC-95, or as a component of FC-203FC. (1Octanesulfoniaccid)(CAS # 2795-39-3).

ACUTE TOXICITY TO AQUATIC INVERTEBRATES (DAPHNIA MAGNA) TEST SUBSTANCE Identity:Mixturecontainingperfluorooctanesulfonawtheich may alsobe referredto as PFOS, FC-95, or as a component of FC-3017. (1Octanesulfoniaccid)(CAS # 2795-39-3).

Processed product for electronics semiconductors applications Application Number: Electronics and semiconductors (Annex E.2.11.)

ATTACHMENT TO LETTER TO C.AUER DATED AUGUST 31,2000 SUPPLEMENTAL SUBMISSION N-ETFOSE Icohol ylperfluorooctanseulfonamidoethanol AcuteToxicit 1.

Larry R.

PFAS-Containing Photo-Acid Generators Used in Semiconductor Manufacturing Semiconductor PFAS Consortium Photolithography Working Group June 8, 2023 Acknowledgments: The PFAS Consortium would like to acknowledge the contributions of the Semiconductor PFAS Consortium Photolithography Technical Working Group for their efforts to compile this information.