Document zzjYG1MvJDpyyVeDvZ4GbR4pB
Annex to Question 2
Emission quantities are not fully known due to the lack of declaration/transparency regarding the quantities on PFAS used in products and materials, so that we limit ourselves to the use and the emission/disposal route.
Sector E.2.10: Applications of fluorinated gases
Subsector Refrigeration
Use Central refrigeration system + plant-related, closed circuit
Air conditioning and Air conditioning clean room,
heat pumps
closed circuit
New Sub-use: dry etching of photomasks/reticles
Etching processes
Properties - Specific heat - Energy efficiency - High precision temperature control
imparted by thermal stability - High precision temperature control
imparted by thermal stability - Viscosity vs temperature
characteristics - Specific heat - Electrical conductivity
characteristics - Anisotrophic etching capabilities
Waste/Emission Exchange only if required, withdrawal by manufacturer/service
Refill if required, takeaway by manufacturer/service, only disposal of residual containers
Are neutralized mainly via exhaust gas cleaning processes (combustion + wet scrubber) and then emitted to the air.
Type of waste treatment Partly recycling, rest not known Not known
n/a
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Sector E.2.11.: Electronics and semiconductor
Subsector Wires and cables
Use Consumable Materials in semiconductor manufacturing support equipment (piping/tubing, replacement parts etc.)
Coating, solvents and cleaning (including water based materials)
Etching, coating, cleaning processes
Properties - Inertness (no outgassing) - Chemical resistance - Mechanical stability - Purity - Low flammability - Temperature stability - Anisotrophic etching capabilities - Developing/developer capabilities
electronic components
Heat transfer fluids
Consumable Materials in photomask/reticle and semiconductor manufacturing support equipment (air and wet chemical filters, seals/o-rings, piping/tubing, embedded lubricants (oils, greases, solids), non-process chemicals, replacement parts etc.) Air conditioning clean room, closed loop
- Inertness (no outgassing) - Chemical resistance - Mechanical stability - Low pressure drop (filters) - Low volatility/high stability - Purity - Low flammability - Temperature stability - Resistance to chemical permeation - High precision temperature control
imparted by thermal stability - Viscosity vs. temperature
characteristics - Specific heat - Electrical conductivity
characteristics
Waste/Emission Delivery to disposal companies
Type of waste treatment Recycling
Are neutralized mainly via exhaust gas cleaning processes (combustion + wet scrubber) and then emitted to the air. Delivery to disposal companies
n/a
Recycling (separation of the components)
Refill if required, take-away by manufacturer/service, only disposal of residual containers
Not known
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Subsector Advanced semiconductor packaging
Use Product protection box, specified by semiconductor industry
Photolithography Surface coating
Photolithography
As both Lithographic protective film (pellicle / protective cover) membranes and AntiReflective (AR) coatings that are optically clear to specific wavelengths of light/radiation
Properties - Temperature resistance - Product protection - Low off-gassing and particle
generation - Electrical non-conductivity Uniformity in coating with minimal effect on properties provided by other critical resist/chemical ingredients (i.e., without impact to refractive indexes) - Low off-gassing and particle
generation - Resistance to chemical permeation - Inertness - Optically clear to the wavelength of
radiation/light used to print upon the customer's wafers. - Resistant to reflection that prevents the transfer of a clear image from the photomask/reticle to the wafer.
Waste/Emission Remain at customer or delivery to disposal companies
Liquid chemicals are collected, partially enters exhaust air, small amounts enters waste water
Remains on product, when discarding/exchanging residual waste
Type of waste treatment Recycling (processing into granules)
Recycling (solvent waste is largely processed for the secondary market)
Waste incineration
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Subsector new Sub-use: tool parts & equipment
Use Semiconductor and photomaskmaking manufacturing infrastructure (production and storage, high purity water manufacturing/delivery systems, high purity chemical & gas delivery systems, air filtration systems, bulk chemical delivery systems treatment and distribution, planar chemical delivery systems, liquid waste collection system, abatement systems, semiconductor wastewater treatment and HVAC including corrosive exhaust ducting and treatment, facilities systems controls, gaskets for pipelines, etc.)
Properties - Inertness (no outgassing) - Chemical resistance - Mechanical stability - Low pressure drop (filters) - Low volatility/high stability - Purity - Low flammability - Temperature stability - Resistance to chemical permeation
(safety requirements of chemical installations)
Waste/Emission Substitute if required
Type of waste treatment Not known
Sector E.2.14.: Lubricants
Subsector Lubricants, Greases
Use - In clean room tools - semiconductor manufacturing
infrastructure, e.g. oxygen plants or other installations, which require high standards on safety
Properties - Inertness - Low off-gassing and particle
generation - Resistance to chemical permeation
(safety requirements of chemical installations)
Waste/Emission Refill if required, take-away by manufacturer/service, disposal of (residual) containers and contaminated wipes
Type of waste treatment Not known, probably waste incineration
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