Document vVo7Orgrmj68EXOMpM1xBnkBR

Company: DOW CHEMICAL Process: POLY-B Node: 5 Page: 1 +--------------------------------------------------------------------------------------------------------------------- Node: 5 D-2002 TO R-2001 LIQUID LINE . rameter: Flow Intention: 20gpm +------------------- |GUIDEWORD (DEVIATION | POSSIBLE CAUSES | CONSEQUENCES T No No Flow SUBJECT LINE OVER FILL D-2002 BLOCKED WRECK D-2002 SUBJECT LINE INTERNALS PLUGGED HIGHER REACTOR NO SPRAY INTO PRESSURE D-2002 FOUL EXCHANGER TRAIN SHUTDOWN COMPRESSOR TRIP | RECOMMENDATIONS | BY HIGH LEVEL ALARM * HIGH DIFF.ALARM ON BOTH PACKING SECTIONS * OPERATOR TRAINING RF WRITE OPER. PROCEDURES MONITOR LEVEL RF * SEE NODE 3 LESS FLOW GC MINIMIZE HORIZ. PIPING GC More More Flow FLUSH LINE LEAKING/OPEN MALFUNCTION OF D-2002 SPRAY CONTROL POOR TRAINING/ OPERATOR ERROR HIGH CAT. CONC. IN BOTTOM OF REACTOR LOW % SOLIDS IN REACTOR WRITE OPER. PROCEDURES RF CONSIDER MONITORING FLUSH HEADER FLOW GC CONSIDER RESTRICTOR IN FLUSH HDR. LINE GC SEE NODE 3 LESS FLOW GC Reverse Reverse REACTOR O.H. SAME AS NO FLOW WRITE PROCEDURES RF Flow VAPOR LINE BLOCKED/PLUGGED +-------------- +-------------- +--------------------------- +----------------------------- +--------------------------- + DO A 121094 CONFIDENTIAL Company: DOW CHEMICAL Process: POLY-B Node: 5 Page: 2 +-------------------------------------------------------------------------------------------------------------------------------------------------------------------- + Node: 5 D-2002 TO R-2001 LIQUID LINE I rameter: Temperature Intention: | +------------------------------------_--_------------------f------ |GUIDEWORD|DEVIATION| POSSIBLE CAUSES I CONSEQUENCES | RECOMMENDATIONS |BY j +------------- +-------------- +--------------------------- +-----------------------------+--------------------------- +---- + More Higher Temp +------------- +-------------- +--------------------------- +-----------------------------+--------------------------- +---- + A 12109^ C0NFI0ENTTA: Company: DOW CHEMICAL Process: POLY-B Node: 5 Page: 3 ------------------------------------------------------------------------------------------------------------------------------------------------------------------------ Node: 5 D-2002 TO R-2001 LIQUID LINE rameter: Contamination Intention: RUST/WATER FREE H---------------- -------------1------------------- --------------H--------------------------------| ----------------------------|------------------------------------------- 1- |GUIDEWORD|DEVIATION| POSSIBLE CAUSES | CONSEQUENCES ( RECOMMENDATIONS (BY j More More Cont IMPROPER CLEANING PRODUCT QUALITY PROCEDURES(RUST KILL REACTOR IN LINE/VESSEL) WRITE ISOLATE/ CLEAN/COMMISION PROCEDURE RF D0 A 121096 CONFIDENTIAL Company: DOW CHEMICAL Process: POLY-B Node: 5 Page: 4 H------------ ---- -------------- --- -- ------------------------ ------------------------------------------------------------------------- -------------- ------------------ ----------------- ------------------------1- Node: 5 D-2002 TO R-2001 LIQUID LINE rameter: Level Intention: NO LEVEL ------------------------+---------------------------------------- ----H------------------------------- ----+-------------------~~+" H |GUIDEWORD|DEVIATION| POSSIBLE CAUSES | CONSEQUENCES | RECOMMENDATIONS |BY | H---------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------------~--"----" --H----------------h No No Level More More Level +-------------------- SEE NO FLOW SEE NO FLOW NODE * 5 DO A 121097 CONFIDENTIAL