Document XznJER5QyVMBQzopQNNddXbMd

owner or operator of a facility or emission source subject to the rules specified in subsection (a), (b) or (c) may operate the euMSTiion source according to the plan and schedule as submitted. e) The plan and schedule shall meet the requirements of 3S 111. Acta. Code 201. Subpart H. including specific interim dates as required tn 35 111. Adm. Code 201.242. (Source: Adopted at 11 111.- Reg. 147JS, effective September.30. 1987) Section 2IS.408 Heatset Web- Offset Lithographic Printing a)'No owner of operator of a heatset web offset lithographic printing, facility, located in Cook. OuPage.rvKane, Lake. Macoupin, Madison. McHenry. Monroe. St. Clair or Will County, emitting over 100 tons/year of. organic utertal..tn the.absence of pollution control equipment, may cause or allow the operation of a heatset web offset press unless: 1) An Incinerator system is installed and ' operated that oxidizes at least 90 percent of the organic materials (measured as.total combustible carbon) in the dryer exhaust atrstreamto carbon dioxide and water; or 2) The fountain solution contains no more than .eight (8) percent, by weight, of volatile organic material and a condensation recovery system Is Installed 'and operated that removes at least 75 percent.of the non-isopropyl alcohol organic materials from the dryer exhaust alrstream. b) No owner or operator of a heatset web- offset lithographic printing facility, located in a county other than Cook. OuPage, Kane, Lake. Hacoupin', Madison. McHenry, Monroe. St. Clair or Will County, emitting over 100 tons/year of organic material, tn the absence of pollution control equipment, may cause or *-** tfce operation of a heatset web offset Z'i'.l c.nless'the fountain solution.contains r.o core than eight (8) percent,'by weight, of - volatile organic material. (Source: Added at 11 111. Reg. 16706. effective September 30. 1987) - SUBPART Q: LEAKS FROM SYNTHETIC ORGANIC CHEMICAL AMO POLYMER MANUfACTURING EQUIPMENT Section 215.420 Applicability . The provisions of Sections 215.421 through 21S.429 of this subpart shall apply to all plants in the State of Illinois which;. manufacture synthetic organic chemic'afs and polymers, except those located in any of the following counties:. Will. McHenry. Cook. OuPagei Lake. Kane. Madison. St. Clair. Hacoupin. and Honroe. The provisions of Section 215.430 through 215.438 shall apply to the counties specifically enumerated above. In addition, if any county is redesignated as non-attainment by the USEPA subsequent to December.31. 1987. the.owner or operator of a . plant located In that county'Shall comply with the requirements of Sections 215.'430: through 215.438 upon the effective date or the redesignation. (Source: Atfdedat IT lit. Keg. 20829. effective December 14. 1987)... Section 21S.42I . General Requirements Tlie.owner or ..operator of a plant which has moire t&n 1,500.'components in gas.or Tight liquid service, which components are used to manufactured the synthetic-organic chemicals, or polymers listed In Appendix 0. shall conduct leak Inspection and repair, programs In accordance, with this Subpart for that equipment cmoanttearlinallngaVaodereterthmainne, d10bpyeArSceTHnt-mevtohTodaWEe-2o6r0g. anic E-168. and E-169. Incorporated by reference In . Section 215.105. A component ..shall be considered.to':be leaking.,if the volatile organic material concentration exceeds-.iO.OOO ppm when measured at a distance of 0 dm from fife component. The provisions, of this Subpart.are not applicable if the products listed in Appendix 0 are made from natural fatty acids. foc. the production of hyxadecyl alcohol. (Source: Adopted-at H-IVV. Regv 20829. effective December 14, 1987) Section 215.422 Inspection Prograim Plan for Leaks The owner, or operator ofra synthetic organ ic chemical or polymer manufacturing plant subject to Section 215.420 shall prepare-an Inspection program plan, whAch.,,contavns.,,at a. minloum:.. a) An Identification of all components and the period in wh-1cb-eaohwlT-1 bemocvUor-ed- ... pursuant to Section 215.422; b) The format for the monitoring log required by Section 21S.423; ": c) A description of the monitoring equipment to be used pursuant to Section 21S.422; and d) A description of tbe-methods to be used~to~. Identify all pipeline valves, pressure relief valves In gaseous service, all leaking:.; components, and the ball and plug valves and. pimps exempted uhder Sectioft'21S.422|iv>" Suetr- that they are obvious and can be located by both plant personnel performing monitoring and Agency personnel performing:inspections. (Source: Adopted at 9 111. Reg. 13960. effective August 28. 1985) 109 -