Document V3LGZd8yJ07Dgdqzn4wj15bE4

. i Sa! apor AR 26 _ 1072 UNITED STATESWEANSVHIRIONNGMTENOTNDA.,CL. P2R0O4T6E0CTION AGENCY WAR 11 2002 orevenmoJnPe--sncoes mo Toc SUBSTANCES Dear Interested Party: Attached Register:a Final Rpulelaese(6f7inFdRco1p1i0e0s8o)fotnwo13reklnaotewdndodicsucmoennttinsutehdatpeprufblluiosrhoeadlkiynl today's Federal sulfonate (PFAS) chemicals making any new manufacture or importation a significant new use; and a Supplemental Proposed Rule of "significant (67 new FR 11014) on 75 use" specifically additional chemicals, defined, low volume, proposing controlled to exclude from the exposure uses in definition semiconductor manufacture, aviation hydraulics, and photography, but to otherwise require submission ofa chemicals after significant new use December 31, 2002. notice These (SN two UN) for actions any manufacture build upon the or or import of these iginal proposed significant new use rule (SNUR) (65 FR 62319, October 18, 2000). perfluorIonoctthye!osriuglifnoanlatpers,opoorsPeFdOSS.NUCRo,mmtheentsuebrjsecntoctheedmtihcaatltshiwsegreenerreifceruresdagteo ocfolPleFcOtiSveelysas "B inconsistent with 3M' use of PFOS to refer only to chemicals length. Many of the chemicals in the original proposed SNUR with an eight-carbon, or C8, chain included a rangeofcarbon chain = co5 = 73 sluengggtehsst,eadlntohmoeugnhcltahteuyreallfodridthienscelutdweoCf8olwliotwh-iunptahcetiroannsg,e.anEdPtAhuhsass audsoipntgedthethgeecneormimcentteerrmsP'FAS & A 32 to refer to any chain length, including higher and lower homologues as PFOS to represent only those chemicals which are predominantly CS. well as C8, and the term ~~ =: = 5 Twenty-six comments were received during the comment period, which was extended from &8 November 17, 2000 to January 1, 2001. A public meeting was held on March 27, 2001. Participants expressed interest in providing additional information on specific chemical uses, sAlolurcceosm,meanntdsr,elmeeaesetsi.ngMuplrteispelnetastuibosntamnattievreiadlast,aasnudbmpiosssti-omnesetwienrgesurbemceiisvseidontshraoreugihncOlcutdoebderin2001. Docket 50639. In these two actions, the Agency finalizes the SNUR essentially as originally proposed for the 200 13 0, chemicals from were associated the o only rigin with al list which were uses on which no discontinued by comments were 3M prior received, to December and were not 31, alleged to be produced by any company other than 3M. In this final rule, EPA also removes from the torwiogicnhaelmpircoaplosswederSNliUsRtedtiwnotchheeomriicgainlasl wShNicUhRwdeuree tnootaninecrlruodrebdyinEtPhAe 3inMcoprhraeslea-toinugt iplnafno.rmTahteisoen from 3M with chemical identity data furnished by the Chemical Abstract Service. CONTAIN NEC Redacted winVIongmeatlAOdess e(UkRL)rhcyit Pg9g0igoiv m 5% Psion ot) I . pn propose"dThSeNsUuRpp,lepmreonptoaslinpgrtohpaotsaendySmNaUnuRfaccotvuerres the remaining 75 or import for any chemicals from the use after December original 31. 2002 `spweocuilfdiccounssetsitwutoeulasdirginoirfbiecacnotnsniedweruesdesriegqnuiifriicnagntpnrieowr nuosteisc:e to EPA, except that the following 1. Use as an anti-erosion additive in fire-resistant phosphate ester aviation hydraulic 2. Uflsueidsa.sa component ofa photoresist substance, including a photo acid generator or p`shuortfaocmtiacntr,oolriathsogarcaopmhpyopnreoncetsosftoanpranotdiu-creefsleecmtiicvoencdouacttiongr,s uosresdimiinlaar components of electronic or other miniaturized devices. 3. fUosretahse eaxncilnutdeerdmeadviiaatteioonnlhyydtroauplriocduflcueiodtahnedr pchhoetmoimciaclrsoulbistthaongcreasphtyo ubseesu.sed solely 4. Use in a surface tension and static discharge control coating on films, papers, and printing plates, oras a surfactant or defoamer in solutions used to process films and papers, in traditional and laser medical imaging and in industrial and consumer film received"Tohnesteheproorpigoisneadl epxrocploussailo.nsTfhreomsetmhiecosingdnuicfticoarntanndeawviuasteiodnefiinndiutsitorniersesspuopnpdliteodcsoubmsmteannttisal mdoattaptroesseunptporirstkacocnocnecrlunssitohnatthwaotutlhdeioustpewceiifgihc tlhoewirveoclounmoem,ilcoawnedxpsoasfeutrye,beannedfiltsowPraerlteiacsuelaurslyesinmay the semiconductor area, they also indicated that 3M has not been the only source for certain specific cthheesmeicaappllsiocantitohnesliwstouulsdedbeinctohnessiedaeprpeldicoantgioonisn.gTahned unsoetofsutbhjoecstetsoptehciefSicNUnoRn,-b3uMt cthheemiidceantlistiiens of tbphereospseoppesaceridaftieecxdcclfhuersmoiimocnathlfesorrwesesptreoecficfitlchaeipmSheoNdtaUosgRrcacopnhhfeiimcdiecunsatelissa,ltio`nbccurlsauifdnteisansgcihmneefmdoiirccmaaallt-isipomenacg(iiCfniBgcI,)erxaecnclduosgtinhoiunzs,escTohtuheleddnaotta sreulbamtietdteexdpboysutrheespahnodtorgerleaapsheys imnadyustbrey,nebeudteidnctlousduepsptohretctahveeaetxctlhuastioand.diTtihoinsalFiinanlfoRrumlaetiaonndon useatSphupeplspielcePamtFieAonnStsalcwhhPeirmcoihcpaoalsrseedtwhhRieulmlese,enlotvtaeksperncohhtaiorbgaiectttihenergri,zthewediilrbl yleillmiiomtwiendvaotuelsuetmhieen,btulelcokhwonoeflxopegoxispcuoarsleul,yreadnetdomalannoddwirrneeglleeaasseeso, f Comments on the Supplemental Proposed Rule must be submitted on or before April 10, 2002. The Final Rule will take effect on April 10, 2002. If you have Questions on these documents, dpolemaisneicaokn.tmaacrtyM@aerpya.Dgoomvi.niak by phone at 202-564-8104, by fax at 202-564-4775, or by email at Sincerely, (le teller Charles M. Auer, Director Chemical Control Division s2 e