Document MDjqozEo4j2d5qVYXjbnm7dk

INTERNAL CORRESPONDENCE GA 1076 FROM R. T. Cheng TO R. L. Gibson, M.D./H. E. Runion SUBJECT PRESENTATION RE: INDUSTRIAL HYGIENE CONCERNS OF GOCHEM ASIA OPERATIONS ' IN REPLY refer to RTC:80-17 date Feb. 22, 1980 Attached is a rough draft of the Presentation To Mr. Roher on the Industrial Hygiene Concerns Of GOCHEM Asia Operations. Mr. John Strausser requested me to mail him two copies of all viewgraphs and handouts before the actual presentation. I think we should discuss this package Tuesday or Wednesday (February 26th or 27th) before mailing it in the final form to Mr. Strausser. The major uncertainties In this presentation is our (Medical Department) recommendation on VCM standard, cost estimates, and our future involvement in GOCHEM ASIA. RTC:vic Attachment R. T. Cheng CUSAROSS 00893 PRESENTATION TO MR. W. C. ROHER INDUSTRIAL HYGIENE CONCERNS OF GOCHEM ASIA OPERATIONS CUSAROSS 00894 A HIGHWAY r STORAGE FILM PLANT LEATHER PLANT <3 M^ 1z--<z: QCC. MASTER BATCH SCRAP TILE PLANT ADM SHOP MONOMER FI PLANT \J \ POLY PLANT MERCURY CELLS CHLOR-ALKALI PLANT CARBIDE PLANT EXTRUSION PIPE PLANT CHINA GULF PLASTICS CORPORATION TOUFEN PLANT CUSAROSS 00895 VCM EXPOSURES STANDARDS 1. U. S. OSHA STANDARD 1 PPM 2. SWEDEN STANDARD: 1 PPM 3. JAPANESE STANDARD: 2 PPM 4. TAIWAN STANDARD: 500 PPM in 1977 50 PPM NOW 5. CGPC INTERNAL STANDARD: 10 PPM 6. GULF RECOMMENDED: (--) ODOR THRESHOLD: 2,000 PPM CUSAROSS 008% HISTORICAL REVIEW OF VCM EXPOSURES AT CGPC February 1974: August 1976: November 1977: October 1979: .1 VCM ODOR READILY SENSED 2. 200 PPM TO 500 PPM TWA EXPOSURE 3. SHORT-TERM EXPOSURES >10,000 PPM .1 VCM ODOR STILL DETECTABLE 2. >50 PPM TWA EXPOSURE 1. VCM ODOR ESSENTIALLY ELIMINATED 2. REACTOR CLEANER'S EXPOSURE 15-50 PPM 3. OTHER POLYMER PLANT WORKER <10 PPM 1. VCM ODOR ELIMINATED 2. REACTOR CLEANER'S EXPOSURE 18 PPM 3. OTHER POLYMER PLANT WORKER 1 - 33 PPM CUSAROSS 00897 TABLE II REACTOR CLEANERS' VINYL CHLORIDE EXPOSURE CHINA GULF PLASTICS CORPORATION REACTOR CLEANER Chen, C. S. Chuang, C. C. Tan, C. K. Chuang, C. C. Tan, C. K. Lai, T. Z. Chen, C. S. Lai, T. Z. Chuang, C. c. Chuang, C. c. Lai, T. Z. Chen, C. S, EMPLOYEE NUMBER 64114 60117 66124 60117 66124 67217 6414 67217 60117 60117 67217 64114 SAMPLE DATE 10-16-79 10-16-79 10-16-79 10-17-79 10-17-79 10-17-79 10-18-79 10-18-79 10-18-79 10-18-79 10-18-79 10-18-79 SAMPLE DURATION (MINUTES) 423 415 405 442 442 442 46 44 43 45 45 45 AVERAGE VCM EXPOSURE PPM 12 16 23 20 23 18 16 22 17 18 17 18 REMARKS Cleaned 6 Reactors Cleaned 6 Reactors Cleaned 6 Reactors Cleaned 6 Reactors Cleaned 6 Reactors Cleaned 6 Reactors Cleaned 1 Reactor Cleaned 1 Reactor Cleaned 1 Reactor Cleaned 1 Reactor Cleaned 1 Reactor Cleaned 1 Reactor Sample Matrix - Charcoal Tube and 3M Brand Organic Vapor Monitoring Badge. Analytical Method = GC & FID 11 CUSAROSS 00898 CGPC VCM AIR POLLUTION EPA VCM EMISION STANDARD TAIWAN EMISSION STANDARD: CGPC IN-PLANT POLLUTION: CGPC HOUSING COMPOUNDS: SURROUNDING COMMUNITY: 10 PPM IN STACK OR EMISSION SOURCES NONE 0 TO 2 PPM 0 TO 0.5 PPM VCM 0 TO 0.5 PPM CUSAROSS 00899 TABLE IV ENVIRONMENTAL AND WORKPLACE VINYL CHLORIDE CONCENTRATIONS AT TOUFEN PLANT CHINA GULF PLASTICS CORPORATION October 19, 1979 SAMPLE NUMBER AG7492 AG7072 AG7289 AG9331 AH5605 AH5149 AG7313 AH5128 AG7370 AG7055 AG7112 AG7407 SAMPLE LOCATION Office, Engineering and Develop ment Building South of Administration Building South of HCL Plant South of Maintenance Shop West of Printing Plant 2nd Power Station Office Room, Chemical Plant Booth at Monomer Plant Office Room, Polymer Plant PVC Package, Drying Plant Control Room, Drying Plant Polymerization Pilot Plant SAMPLE DURATION (MINUTES) 457 436 448 423 420 417 412 408 402 394 392 397 AVERAGE VCM CONCENTRATION PPM 2.6 0.44 0.41 0.94 0.53 15 2.1 2.2 2.7 0.87 1.4 . 5.0 Sample Matrix = 3M Brand Organic Vapor Monitoring Badges. Analytical Method = GC & FID. ClfSARO.SS ()09()t 14 TABLE V VINYL CHLORIDE EXPOSURES OF FABRICATION COMPLEX WORKERS DUE TO INPLANT VCM AIR POLLUTION CHINA GULF PLASTICS CORPORATION SAMPLE DATE 10-16-79 10-16-79 10-16-79 10-16-79 10-16-79 10-16-79 10-17-79 10-17-79 10-17-79 10-17-79 10-17-79 10-17-79 10-17-79 10-18-79 10-18-79 10-18-79 10-18-79 10-18-79 10-18-79 10-18-79 10-18-79 10-18-79 10-18-79 10-18-79 10-11-79 10-11-79 10-11-79 10-11-79 WORKER Liu, S. L. Chen, Y. K. Chai, C. S. Chen, 0. S. Lin, Z. S. Chang, S. S. Chen, Y. K. Peng, W. C. Chai, C. S. Huang, W. H. Wu, C. Y. Liu, S. L. Lee, K. J. Chuang, M. L. Chang, Y. H. Chang, S. S. Lien, Y. C. Liao, W. H. Tong, S. L. Ko, C. F. Chai, F. L. Lin, Z. S. Chen, J. S. Hsu, Y. K. Lee Tzung Feng Liu JOB LOCATION Leather Plant Leather Plant Leather Plant Film Plant Printing Plant Printing Plant - Toufen - Toufen - Toufen - Toufen - Toufen - Toufen Leather Plant Leather Plant Leather Plant Leather Plant Leather Plant Leather Plant Leather Plant - Toufen - Toufen - Toufen - Toufen - Toufen - Toufen - Toufen Printing Plant Printing Plant Printing Plant Printing Plant Printing Plant Printing Plant Printing Plant Printing Plant Printing Plant Printing Plant Printing Plant - Toufen - Toufen - Toufen - Toufen - Toufen - Toufen - Toufen - Toufen - Toufen - Toufen - Toufen Printing Plant - Taoyuan Printing Plant - Taoyuan Printing Plant - Taoyuan Printing Plant - Taoyuan AVERAGE VCM EXPOSURE PPM 0.54 0.49 0.49 0.53 0.54 ND ND ND ND ND 0.03 0.20 0.12 0.12 0.15 0.15 0.12 0.15 0.18 0.15 0.15 0.18 0.12 ND ND ND ND Sample Matrix = 3M Brand Organic Vapor Monitoring Badge. Analytical Method = GC & FID. ND = Not Detected; Less Than 0.01 ppm. 16 CUSAROSS 00901 W/M> S_ _ /* 2,ppr # 0 ppm 11 0*5 fpr * *i 2JP,t1 ' \ POLY * l5pr~ # o.if- MERCURY U'ATHZR pi a ,/r 0.5 IfJ-Pif\UT VCM A/P POLLdT/Od AT C$PC TDUFEP PLAPT CUSAROSS 00902 CGPC VCM CONTROL RECOMMENDATIONS 1. A THREE-STEP VCM EXPOSURE CONTROL PROGRAM WAS RECOMMENDED IN 1976 (SEE HANDOUT). STEP ONE: < 2,000 PPM, STEP TWO: 10 PPM, STEP THREE: 1 PPM. 2. STEP ONE ACHIEVED. 3. STEP TWO CAN BE ACHIEVED WITH REDUCTION OF REACTOR CLEANING FREQUENCY. 4. STEP THREE CAN BE ACHIEVED BY ADOPTING AN AUTOMATED REACTOR CLEANING SYSTEM TO ELIM INATE ROUTINE REACTOR ENTRY. 5. IN-PLANT VCM AIR POLLUTION PROBLEM WILL BE MORE OR LESS UNDER CONTROL WHEN STEP THREE IS ACHIEVED. 6. COSTS: CUSAROSS 00903 CGPC MERCURY EXPOSURE EXPOSURE STANDARD FEBRUARY 1974 LEVEL AUGUST 1976 LEVEL NOVEMBER 1979 LEVEL 0.05 mg/m3 0.25 mg/m3 0.05 mg/m3 0,02 mg/m3 ALL CHLOR-ALKALI PLANT WORKERS WERE WITHIN MERCURY EXPOSURE STANDARD EXCEPT THE TWO DOWNSTAIRS OPERATIONS: 1. FLAKE CAUSTIC-SODA MACHINE OPERATOR: 0.13 mg/m3 2. MERCURY RECOVERY OPERATOR: 0.10 mg/m3 RECOMMENDATIONS 1. MOVE THE CAUSTIC-SODA MACHINE OUT OF DOWNSTAIRS. 2. RESPIRATORY PROTECTION FOR UN-ROUTINE OPERATION. COSTS: $5,000 CUSAROSS 00904 CGPC SOLVENTS EXPOSURE SOLVENTS USED: MEK, TOLUENE, (BENZENE), MIBK, CYCLOHEXANONE, DMF, THF, etc. SOLVENT USERS: SURFACE TREATING MACHINES COLOR PRINTERS EXPOSURE STANDARD: MEK - 200 PPM TOLUENE - 100 PPM BENZENE - 10 OR 1 PPM EXPOSURES OF SURFACE TREATING MACHINE OPERATORS 1974: 1976: 1979: CONCLUSION: 1,000 PPM 200 - 500 PPM 50 - 200 PPM NEEDS SOME IMPROVEMENT EXPOSURES OF COLOR PRINTER OPERATORS 1974: 500 - 1,500 PPM 1976: 200 - 500 PPM 1979: <50 PPM CONCLUSION: PROBLEM UNDER CONTROL CUSARO.S.S 00905 CGPC DUST EXPOSURES STABILIZERS: LEAD, CADMIUM, BARIUM STEARATES PIGMENTS: LEAD, CHROMIUM, CADMIUM, ORGANIC DYES PVC DUST: NEW TOXICOLOGIC STATUS EXCESSIVE PNEUMOCONIOSIS FED REGISTER NOTICE (December 18, 1979) EXPOSURE STANDARDS LEAD: 0.05 mg/m3 CADMIUM: 0.05 mg/m3 BARIUM: 0.5 mg/m3 CHROMIUM: 0.05 mg/m3 PVC DUST: Now - 10 mg/m3 Future - 2 mg/m3 (?) CGPC EXPOSURES MANY OVEREXPOSURES TO PVC DUST SOME OVEREXPOSURES TO LEAD ONE OR TWO OVEREXPOSURES TO CHROMIUM RECOMMENDATION: ENCLOSURE, VENTILATION, HOUSEKEEPING COSTS: $100,000 CUSAROSS 00906 A/30/74 -31- RTC Figure 12 Suggested Side-Draft Hood for Control of Lead, Cadmium & Barium Dusts, CUSAROSS 00907 ASIA POLYMER CORPORATION 8RAND NEW PLANT MANUFACTURING: LOW DENSITY POLYETHYLENE MAJOR HEALTH HAZARD: N-HEXANE MINOR PROBLEMS: LAB VENTILATION, NOISE N-HEXANE: NEUROPATHY OLD STANDARD 500 PPM (1972) EXISTING STANDARD 100 PPM CHANGE INTENDED 25 PPM APC CATALYST WORKER'S EXPOSURE: 43 AND 240 PPM RECOMMENDATION VENTILATION IMPROVEMENT OF CATALYST MIXING BUILDING AND LABORATORY. COSTS $1,000 - $5,000 CUSAROSS 00908 TAITA CHEMICAL COMPANY, LTD. FORMALDEHYDE EXISTING OSHA STANDARD: 3 PPM NIOSH 1974 RECOMMENDATION: 1 PPM CUT REPORT: NASAL SQUAMOUS CELL CARCINOMAS IN RATS AT 15 PPM. A FEW AT 6 PPM AND 2 PPM LEVEL. FUTURE STANDARD: 0.1 PPM - 1 PPM (?) ODOR THRESHOLD: 0.1 PPM - 1 PPM EXPOSURE LEVEL (SAMPLE) LANDSDALE PLANT 0.3 PPM - 2 .5 PPM RECOMMENDATIONS* * * ENGINEERING INPUT AT ABS PLANT DURING CONSTRUCTION STAGE FOR AN CONTROL. * SPI ESTIMATE $2.56 MILLION CAPITAL COSTS FOR A TYPICAL 62.5 MILLION LB/YR ABS PLANT TO MEET 2 PPM STANDARD. * TAITA ABS PLANT 15,000 Mta, OR APPROXIMATELY 33 MILLION LB/YR, NEED $1.6 MILLION FOR CAPITAL COSTS BASED ON SPI FORMULA. * INDUSTRIAL HYGIENE SURVEY OF ABS PLANT, FORMALDE HYDE PLANT, POLYSTYRENE PLANT, ETC. CUSAROSS 00909 TAITA CHEMICAL COMPANY LTD. NO INDUSTRIAL HYGIENE VISIT MANUFACTURING: POLYSTYRENE, FORMALDEHYDE, GLUES PHENOLIC COMPOUNDS, ABS (1980) ACRYLONITILE (AN): CARCINOGEN, TERATOGEN* * OSHA STANDARD (OCTOBER 1978): 2 PPM TWA 10 PPM CEILING * DU PONT, GOODYEAR, MONSANTO, DOW INDICATED THE STANDARD IS ACHIEVEABLE, WITH FEW EXCEPTIONS, THROUGH EXHAUST VENTILATION, PROCESS CONTAIN MENT AND CHANGES IN JOB PROCEDURES * AN EXPOSURES DURING ABS MANUFACTURING 1. CONVEYANCE OF AN MONOMER TO AND FROM STORAGE TANK. 2. LEAKS FROM VALVES, GASKETS, PIPES AND SAMP LING POINTS. 3. BLENDING, FLOCCULATION, DRYING. 4. RESIDUAL AN DURING POLYMER PROCESSING. 5. REPORTED TYPICAL HIGH EXPOSURES: 20 PPM AT FLOCCULATION. CUS A ROSS 00910 CHINHAE CHEMICAL COMPANY MANUFACTURING: UREA, COMPLEX FERTILIZER, GYPSUM, SULFURIC ACID MAJOR HEALTH HAZARDS: AMMONIA, FLUORIDES, FREE SILICA MINOR PROBLEMS: HYDROGEN FLUORIDE, WELDING FUMES AMONIA EXPOSURE EXPOSURE STANDARD: 25 PPM TWA, 35 PPM CEILING MEASURED LEVELS: 5 PPM IN GRANULATION CONTROL ROOM >100 PPM AT GRANULATION TOWER CUSAROSS 00911 CHINHAE CHEMICAL COMPANY DUST EXPOSURE FREE SILICA CONTENT OF DUST -v 4% DUST EXPOSURE STANDARD **4.3 mg/ 3 DUST OVEREXPOSURE: 6 OUT OF 13 SAMPLES RESPIRATORS WORN BY WORKERS IN DUSTY OPERATIONS. FLUORIDE EXPOSURE * USE OF RESPIRATOR PREVENTS MOST OVEREXPOSURE * URINE FLUORIDE LEVEL AS INDICATION OF FLUORIDE EXPOSURE * 4 OUT OF 46 WORKERS SHOWED POSSIBLE WORKRELATED FLUORIDE OVEREXPOSURE RECOMMENDATIONS * COMPREHENSIVE VENTILATION ENGINEERING STUDY * SEARCH AND SECURE LEAKS * INDUSTRIAL HYGIENE TRAINING CUSAROSS 00912 GOCHEM ASIA OPERATION INDUSTRIAL HYGIENE PERSONNEL TRAINING TRAINING PROGRAM ' NIOSH TRAINING COURSES * GULF IN-HOUSE TRAINING ' ON-THE-JOB TRAINING TRAINEES . TWO FROM KOREA OIL CORPORATION (SEE SCHOEBERLEIN'S LETTER OF ACCEPTANCE) * ONE FROM CHINHAE CHEMICAL COMPANY, LTD. * ONE OR TWO FROM TAIWAN OPERATION (SEE MR. GAMBRILL'S LETTER) CUSAROSS 00913