Document 2qQBRE5MnKGn4B4DYwx1Yx1Dr

PFAS in photolithography JSR ......,, , 28/03/2023 Production of photoresists in Leuven including EUV Sunnyvale, CA United States worldwide presence JSR Global network Leuven Belgium Semiconductor Life Sciences Business Seoul South-Korea Shanghai China Tokyo (HQ) Yokkaichi Kyushu Japan Hsinchu Taiwan Singapore Singapore 2 Photolithographic process Repeat process at least 20x Lines, contact holes, insulation, ... The final product Source: https://en.wikipedia.org/wiki/Back_end_of_line PFAS are essential in photolithography Depending on the type of photoresist the following short chain PFAS may be present as ingredients: Photoacid generators (PAGs): generates strong acid on exposure to light PFAS surfactants: low surface tension, hydrofobic/hydrophilic behaviour Polymers PFAS consumption in photolithography is very small compared to global releases. In EEA: Photolithography: 2.3 tonnes / year EU PFAS 2020: 850000 tonnes / year (Annex XV report PFAS restriction proposal) PFAS restriction proposal Potential derogation of 13.5 years for the semiconductor manufacturing process Semiconductor manufacturing process should cover the whole semiconductor manufacturing ecosystem other actors are also dependent on PFAS Process chemistries Semiconductor manufacturing equipment Semiconductor manufacturing support equipment Semiconductor manufacturing infrastructure Semiconductor device The PFAS restriction should not undermine the EU Chips Act (a framework to strengthen the semiconductor section in the EU; https://commission.europa.eu/strategy-and-policy/priorities-2019-2024/europe-fitdigital-age/european-chips-act_en). Thank you for your attention. Questions? JSR ......,, ,